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, NVIDIA introduced its CuLitho software library, which promises to speed up photomask development by up to 40 times. Today, NVIDIA announced a partnership with TSMC and Synopsys to implement its computational lithography platform and use the company’s next-generation Blackwell GPUs for AI and HPC applications.
The development of photomasks is a crucial step for every chip ever made, and NVIDIA’s CuLitho platform, enhanced with new generative AI algorithms, significantly speeds up this process. NVIDIA says computational lithography consumes tens of billions of hours per year on CPUs. By leveraging GPU-accelerated computational lithography, cuLitho substantially improves over traditional CPU-based methods.
